四甲基硅烷Tetramethylsilane

硅的电负性（1.90）低于碳（2.55），使甲基上电子云密度高、屏蔽强，信号出现在比绝大多数有机物都更高场的位置，不会与样品峰重叠；12 个氢完全等价，只出一个尖锐单峰，少量即可观察；化学惰性，不与样品反应；沸点仅 26.6 °C，测完易蒸发除去，回收样品方便；能溶于大多数有机溶剂。水溶液中则用 DSS 或 TSP 等水溶性参比物。

Silicon (electronegativity 1.90) is less electronegative than carbon (2.55), so the methyl groups are electron-rich and strongly shielded, and the signal lies upfield of almost all organic compounds without overlapping them; the 12 equivalent hydrogens give a single sharp peak visible in small amounts; it is chemically inert; it boils at only 26.6 °C, so it evaporates easily and the sample can be recovered; and it dissolves in most organic solvents. In water, soluble references such as DSS or TSP are used.

1958 年美国化学家乔治·蒂尔斯提出用 TMS 作 NMR 内标参比，取代此前使用的水、苯、氯仿等参比物，统一了化学位移标度。现代仪器常以氘代溶剂的残余质子峰（如 CDCl₃ 中 CHCl₃ 在 δ 7.26）间接定标。

In 1958 the American chemist George Tiers proposed TMS as the internal NMR reference, replacing water, benzene, chloroform and others and unifying the chemical-shift scale. Modern spectra are often referenced indirectly to the residual proton signal of the deuterated solvent, such as CHCl₃ in CDCl₃ at δ 7.26.

TMS 也是化学气相沉积制备碳化硅和二氧化硅薄膜的前驱体。三甲基硅基（TMS 基，–Si(CH₃)₃）是有机合成中常用的羟基和炔基保护基，也用于气相色谱分析前的硅烷化衍生。

TMS is also a precursor for chemical vapour deposition of silicon carbide and silicon dioxide films. The trimethylsilyl (TMS) group, –Si(CH₃)₃, is a common protecting group for hydroxyl and alkyne groups in synthesis and is used to silylate compounds before GC analysis.